World's first 300mm-fab compatible directed self-assembly process line
At next weeks SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world first 300mm fab-compatible Directed Self-Assembly (DSA) process line all-under-one-roof in imecs 300mm cleanroom fab. The upgrade of an academic lab-scale DSA process flow to a fab-compatible flow was realized in collaboration with the University of Wisconsin, AZ Electronic Materials and Tokyo Electron Ltd. Imecs DSA collaboration aims to address the critical hurdles to take DSA from the academic lab-scale environment into high-volume manufacturing....
Source: PhysOrg - Friday, 10 February
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